BluGlass Limited (ASX: BLG) has successfully produced p-type gallium nitride (GaN) films, using its low temperature Remote Plasma Chemical Vapour Deposition (RPCVD) technology, that meet industry benchmarks.
The company has succeeded in demonstrating p-GaN films grown at low temperature with electrical properties equivalent to films grown using the industry standard process – MOCVD.
The electrical performance properties were independently measured and verified by the Australian National University, a leading university in semiconductor physics.
BluGlass is now in a position to begin experiments targeting improved efficiency of Light Emitting Diodes (LED) devices using RPCVD grown p-GaN layers to demonstrate the commercial value of a low temperature technology.
The company will do this by making a test LED device using RPCVD to grow p-GaN on top of an MOCVD grown partial LED structure and to subsequently measure the light output of the device.
With a lower growth temperature than MOCVD, BluGlass’ proprietary RPCVD technology has the potential to allow LED manufacturers to create higher performing devices.
This is achieved by reducing the multi-quantum well or active region’s exposure to high temperatures which currently leads to a performance loss.
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